Cel The STREP proposal Radical Innovation Maskless Nanolithography (RIMANA) aims to research and develop a key maskless nano-patterning technology for low to medium volume production, essential for the semiconductor industry and emerging nanotechnology industry.RIMANA is driven by two global industrial needs:- An ML2 tool for short run and low to medium volume leading edge device manufacturers (Logic, ASIC, Silicon Foundries)- A fast Mask Writer for the leading edge high volume device manufacturers (MPU, DRAM, Logic)Both global industrial needs are addressed by the proposed RIMANA project with the following overall S/T objectives and work plans:- Concept and realisation of a new, highly innovative compact APS (Programmable Aperture Plate System), including high-speed electronics with the ability to generate a massive parallelisation of electron beams for the 32nm technology node and beyond- Concept and realization of Data Path improvements to achieve higher data rates- Design and generation of test benches to demonstrate sub-32nm node ML2 high throughput capabilities in resist- Brainstorm of results with perspectives for potential industrial realisationThe key challenges will be to explore and develop essential elements for the massive parallelisation of electron-beams and electron-optics, retaining ultimate resolution down to the nanometre scale, while minimising throughput-resolution trade-offs.The project will be carried out by a strong and diversified team from industry, academia and acclaimed European research institutes, under the leadership of IMS Nano-fabrication GmbH, an SME with extensive experience in cutting-edge charged particle nano-fabrication research and technology.RIMANA is harmonised completely with the FP6 strategic objective IST NMP-3. In particular, RIMANA addresses the need for "maskless nano-patterning for low to medium volume production for the 32nm node and beyond". Dziedzina nauki engineering and technologynanotechnologynatural sciencesphysical scienceselectromagnetism and electronicssemiconductivitynatural scienceschemical sciencesinorganic chemistrymetalloids Program(-y) FP6-NMP - Nanotechnologies and nanosciences, knowledge-based multifunctional materials and new production processes and devices: thematic priority 3 under the 'Focusing and integrating community research' of the 'Integrating and strengthening the European Research Area' specific programme 2002-2006. Temat(-y) Data not available Zaproszenie do składania wniosków Data not available System finansowania STREP - Specific Targeted Research Project Koordynator IMS NANOFABRICATION GMBH Wkład UE Brak danych Adres SCHREYGASSE 3 1020 WIEN Austria Zobacz na mapie Koszt całkowity Brak danych Uczestnicy (7) Sortuj alfabetycznie Sortuj według wkładu UE Rozwiń wszystko Zwiń wszystko ARC SEIBERSDORF RESEARCH GMBH Austria Wkład UE Brak danych Adres Kramergasse 1 WIEN Zobacz na mapie Koszt całkowity Brak danych DELONG INSTRUMENTS AS Czechy Wkład UE Brak danych Adres BULHARSKA 48 61200 BRNO Zobacz na mapie Koszt całkowity Brak danych FACHHOCHSCHULE VORARLBERG GMBH Austria Wkład UE Brak danych Adres Achstrasse 1 DORNBIRN Zobacz na mapie Koszt całkowity Brak danych Fraunhofer Gesellschaft zur Förderung der angewandten Forschung e.V. Niemcy Wkład UE Brak danych Adres Hansastrasse 27C MUENCHEN Zobacz na mapie Koszt całkowity Brak danych INSTITUTE OF MICROELECTRONICS TECHNOLOGY RAS Rosja Wkład UE Brak danych Adres Moscow District CHERNOGOLOVKA Zobacz na mapie Koszt całkowity Brak danych TECHNION - ISRAEL INSTITUTE OF TECHNOLOGY Izrael Wkład UE Brak danych Adres Technion City HAIFA Zobacz na mapie Koszt całkowity Brak danych USTAV INFORMATIKY, SLOVENSKA AKADEMIA VIED Słowacja Wkład UE Brak danych Adres Dubravska Cesta 9 BRATISLAVA Zobacz na mapie Koszt całkowity Brak danych