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PULLing the limits of NANOCmos electronics

PULLing the limits of NANOCmos electronics

Objective

PULLNANO is a 30-month IP proposal for a powerful project focused on advanced RTD activities to push forward the limits of CMOS technologies. PULLNANO focuses on the development of 32 and 22nm CMOS technology nodes opening the way to the long term future of these technologies.

The 1st objective of the project, to be achieved at t0+24, is the feasibility demonstration of 32nm node Front-End and Back-End process modules through a very aggressive SRAM chip and a multilevel metal stack structure.

The 2nd objective is to realize research on the materials, devices, architectures, interconnects modeling and characterization to prepare the future 22nm node. For this purpose, PULLNANO incorporates an unprecedented number of Academic teams organized in clusters.

The 3rd objective is to establish a common action between technology and design people in order to assess the technologies in terms of performances and power consumption.

The 4th objective is to define, through a forum of European equipment suppliers, the specifications of future advanced process, characterization and metrology equipments. PULLNANO starts from the ongoing, very successful, NANOCMOS project focused on the 45nm technology.

The original Consortium is enlarged to gather the best European competences in the domain. PULLNANO establishes close relation with the MEDEA+ programmes, where PULLNANO results are developed towards the industrial exploitation phase. This cooperation optimizes European funding while avoiding overlaps. PULLNANO adopts a professional management structure that deals with the complexity and ambitions of the project. PULLNANO is a reference project and a unique opportunity to increase the worldwide impact of European Nanoelectronics and create the conditions for future IST application.

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Coordinator

STMICROELECTRONICS SA

Address

29 Boulevard Romain Rolland
92120 Montrouge

France

Administrative Contact

Participants (50)

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ACIES SAS

France

ALMA MATER STUDIORUM - UNIVERSITA DI BOLOGNA

Italy

CAMECA SAS

France

CENTRE D'ELABORATION DES MATERIAUX ET D'ETUDES STRUCTURALES

France

CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE

France

COMMISSARIAT A L'ENERGIE ATOMIQUE

France

CONSORZIO NAZIONALE INTERUNIVERSITARIO PER LA NANOELETTRONICA

Italy

Chalmers Tekniska Hoegskola Aktiebolag

Sweden

ECOLE CENTRALE DE LYON

France

EIDGENÖSSISCHE TECHNISCHE HOCHSCHULE ZÜRICH

Switzerland

EUROPEAN SYNCHROTRON RADIATION FACILITY

France

FORSCHUNGSZENTRUM JUELICH GMBH

Germany

FRAUNHOFER IAF

Germany

FREESCALE SEMICONDUCTEURS CENTRE DE RECHERCHE CROLLES SAS

France

GESELLSCHAFT FUER ANGEWANDTE MIKRO- UND OPTOELEKTRONIK MIT BESCHRANKTER HAFTUNG - AMO GMBH

Germany

IMAGINE OPTIC

France

INFINEON TECHNOLOGIES AG

Germany

INSTITUT NATIONAL DES SCIENCES APPLIQUEES DE LYON

France

INSTITUT POLYTECHNIQUE DE GRENOBLE

France

INTERUNIVERSITAIR MICRO-ELECTRONICA CENTRUM VZW

ION BEAM SERVICES

France

ISD LYSEIS OLOKRIROMENON SYSTIMATONANONYMOS ETAIREIA

Greece

MAGWEL NV

Belgium

NATIONAL TECHNICAL UNIVERSITY OF ATHENS

Greece

NOVA MEASURING INSTRUMENTS LTD

Israel

NXP SEMICONDUCTORS BELGIUM NV

Belgium

NXP SEMICONDUCTORS CROLLES SAS

France

PHILIPS ELECTRONICS NEDERLAND B.V.

Netherlands

POLITECHNIKA WARSZAWSKA

Poland

POLITECNICO DI MILANO

Italy

QIMONDA DRESDEN GMBH & CO.OHG

Germany

STMICROELECTRONICS CROLLES 2 SAS

France

STMICROELECTRONICS SRL

Italy

TECHNISCHE UNIVERSITAET CHEMNITZ

Germany

TECHNISCHE UNIVERSITAET WIEN

Austria

THE UNIVERSITY OF GLASGOW

United Kingdom

THE UNIVERSITY OF NEWCASTLE UPON TYNE

United Kingdom

THE UNIVERSITY OF WARWICK

United Kingdom

UNIVERSITA DEGLI STUDI DI UDINE

Italy

UNIVERSITA DI PISA

Italy

UNIVERSITE CATHOLIQUE DE LOUVAIN

Belgium

UNIVERSITE D'AIX-MARSEILLE III

France

UNIVERSITE DE SAVOIE

France

UNIVERSITE DES SCIENCES ET TECHNOLOGIES DE LILLE - LILLE I

France

UNIVERSITE JOSEPH FOURIER GRENOBLE 1

France

UNIVERSITE MONTPELLIER II

France

UNIVERSITE PARIS-SUD

France

UNIVERSITE PAUL SABATIER TOULOUSE III

France

UNIVERSITY COLLEGE CORK, NATIONAL UNIVERSITY OF IRELAND, CORK

Ireland

UNIVERSITY OF LIVERPOOL

United Kingdom

Project information

Grant agreement ID: 026828

  • Start date

    1 June 2006

  • End date

    30 November 2008

Funded under:

FP6-IST

  • Overall budget:

    € 44 940 703

  • EU contribution

    € 25 000 000

Coordinated by:

STMICROELECTRONICS SA

France