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MAsk less lithoGraphy for IC manufacturing (MAGIC)
ID: 214945
Start date: 2008-01-01, End date: 2010-12-31
In the CMOS manufacturing environment, the mask-based optical lithography technique is up to now the driving solution to deal with all industry concerns. Nevertheless, this solution becomes less effective for each new technology node. Effectively, it requires more and more co...
Programme: FP7-ICT
Record Number: 85374
Last updated on: 2017-04-13
List retrieved on: 2018-05-22
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