Community Research and Development Information Service - CORDIS


A photomask linewidth standard has been developed under a BCR funded research contract. This report covers the progress of the work starting from its initial requirement. A description of the standard together with the reason behind the selection of the materials is given. Details of the lithography technique used and the process control required to achieve the goal are presented. The design of the pattern and the amendments which were necessary to make its production viable are also presented. The report describes in detail the measurement methods and technical achievements which made it possible to calibrate the widths of the smallest features of the final standards to +/- 20 nm. This report includes instructions and precautions to be observed in using the standard to ensure optimum transfer of the dimensional calibration and also comments on best handling and storage practice to obtain maximum useful service from the standard.

Additional information

Authors: NUNN J, National Physics Laboratory, Teddington (GB);MIRANDE W, Physicalisch-Technische Bundesanstalt, Braunchweig (DE);TALENE N, Du Pont Photomasks, Rousset (FR);SALIERI P, CEC Bruxelles (BE)
Bibliographic Reference: EUR 18201 EN (1998) 54pp., free of charge
Availability: Available form the DG XII Documentation Centre, European Commission, 200 rue de la Loi, B-1049 Bruxelles (BE), Fax: +32-2-2969823
ISBN: ISBN 92-828-3078-0
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