Community Research and Development Information Service - CORDIS


Nano fabrication with focused ion beams (NANO-FIB)

Project ID: G5RD-CT-2000-00344
Funded under: FP5-GROWTH


The development of industrial processes for the patterning of materials on the nano-scale is one of the major challenges of nanotechnology. Ion beams are in principle well suited to nano-fabrication because ions suffer very little scattering. By narrowly focusing ion beams, and scanning them across the substrate, the creation of feature sizes in the tens of nano-metre range is possible. Nano-fabrication with scanned focused ion beams (FIB) has already found applications in IC manufacture as a complement to other technologies, for relatively small operations on individual chips on the wafer. FIB will find further niches in the fabrication of small series of nano-devices.

This project summary is one of a series featured in the nanotechnology projects showcase on CORDIS:

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