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Polymer modification by ion irradiation

Ion irradiation processes have been developed with polymers in 2 areas:
doping of electroactive polymers to produce electronically active devices, such as pn junctions, or metal insulator semiconductor (MIS) structures;
achievement of lines of high conductivity, and localized dry etching for optic applications.
The latter involves the use of sources of very high ion flow rate (greater than 10{17} cm{-2} s{-1}) such as field effect ion sources (FEIS). The aim of these researches is the development of monolithic optoelectronic circuits on polymers.

Reported by

University of Limoges
123,avenue Albert Thomas
87060 Limoges
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