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Plasma chemical vapour deposited cubic boron nitride films

This in depth research study focusses on the in situ control of plasma assisted deposition of cubic boron nitride film with the final goal to understand and model the chemistry and physical mechanisms of their generation.

The research is divided into 2 parts:
set up of plasma assisted chemical vapour deposition (PACVD) chambers, plasma diagnostics techniques and in situ measurements;
investigation of the influence of hardware and process parameters settlings on plasma composition and cubic boron nitride (BN) properties on silicon (Si) and steel substrates.

Reported by

Universite Libre de Bruxelles
50,Avenue F D Roosevelt
1050 Bruxelles
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