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Low energy implantation source of implantation of fullerenes

A new low energy ion source was designed, built and tested for cheap and efficient low energy ion implantation of fullerenes and related materials. The ion source is based on evaporation of the metal followed by surface ionisation on a heated rhenium grid.

The characteristics of the source are currently being extensively tested. It can produce stable ion beams of a few hundred nA current for the alkali metals and Al at ion energies in the range 10-100eV. A new set of ion optics was designed, built and tested for extracting the ions from the source and introducing them to the implantation chamber. The production of endohedral fullerenes using this new, general source has been demonstrated.

More information on the Nice project can be found at:

Reported by

Göteborg University
School of Physics and Engineering Physics, Gothenburg University
41296 Göteborg