Wspólnotowy Serwis Informacyjny Badan i Rozwoju - CORDIS

Extension of process capabilities of thin layer imaging by overbake and developer tuning

Through the UV2Litho project, our knowledge and expertise in addressing process extensions through improving chemical contrast in photo resist, rather than optical contrast obtained by optical extension techniques, was significantly broadened.

The results have enabled Philips to exploit this knowledge for gate patterning at dimensions far beyond previously envisioned, applying larger wavelengths. This advantage was mainly achieved by a smart tuning of acid dose contrast through the optimisation of acid and quencher interactions in photo resist.

Furthermore, process enhancements gained with developer tuning was demonstrated to enable further extension of optical lithography (193nm, and for that matter 157nm), thereby providing early and cost effective solutions for the (sub-) 65m technology node.

Results and models behind the optimisation were presented at an early stage in the UV2Litho project, followed by publication in lithography related conferences. Also, the "tricks" on overbake integration for enhancing small poly gate printability was shared in great detail with IMEC to broaden their gate patterning capabilities.

The benefits of these techniques are often of temporary nature. Once new and improved high resolution exposure tools become available for manufacturing, the manufacturing floor will standardise the process and minimize process times as much as possible for cost reasons. However, in the R&D stage of a new technology where these tools simply are not available, process extensions have proven to be a very valuable tool in creating next-generation dimensions with good printability, at the expensive of alternative developer conditions and/or bake durations.

More information on the UV2LITHO project can be found at:

Reported by

Philips Innovative Technology Solutions
Interleuvenlaan 80
3001 Leuven
See on map
Śledź nas na: RSS Facebook Twitter YouTube Zarządzany przez Urząd Publikacji UE W górę