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Effect of ion energy on film deposition

Electron cyclotron resonance (ECR) excited plasmas are especially useful for processes requiring low pressure and low gas temperature, and for the deposition of insulating layers. In this case ECR plasma is generated by coupling a circularly polarized microwave (2.45 GHz) into the reaction chamber. Resonance with the electrons gyrating in the overlying magnetic field at 87.5 mT leads to an acceleration of the electrons, which in turn ionize the processing gas.
For the deposition of hydrocarbon and polymerin like hydrocarbon films it has been shown that the impact energy of ions on the substrate has a decisive effect on microstructure and macroscopic properties of the deposited films. The possible control of ion energies by varying the magnetic field configuration makes the ECR plasmas attractive for methane film deposition altering the film properties.
In order to investigate this relationship an ion energy analyzer was introduced into the reaction chamber in place of the substrate. Ion energy distributions in carbon and methane under various discharge conditions were measured.

Reported by

Max-Planck-Institute fuer Plasmaphysik
Bolzmannstrasse 2
85748 Garching bei Muenchen
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