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High frequency plasma enhanced chemical vapor deposition of optimized SiOx coatings on Mg-alloys

The results refer to the development of a PECVD process for depositing SiOx coatings on Mg-alloys by applying frequencies higher than the conventional 13.56 MHz i.e 27.12, 40.68 and 54.24 MHz. This approach allows the deposition of SiOx coatings at higher growth rates, with better adhesive properties and with a rather high deposition and power usage efficiency. This is basically the result of the increase of the precursor¿ s vapour dissociation due to the higher plasma density and more resistive character of the discharges. Thickness non-uniformities that can be raised from the higher frequencies has been minimised using a special reactor configuration.

Reported by

Plasma Technology Lab.
Dep. Of Chemical Engineering – University of Patras
26504 Patras
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