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Atomic layer deposition applied to synthetic carburant production and low temperature microthermal imaging. New sputtering process applied to control oxygen stoechiometry and diffusion in oxide films

Final Report Summary - ALD-SPUTTERING-OXIDE (Atomic layer deposition ... New sputtering process applied to control oxygen stoechiometry and diffusion in oxide films)

The main objective of the project is provide research opportunities of Dr Erwan Rauwel for further developing his own research skills and directions in combination with a three year researcher position at the University of Oslo (UiO). Dr Rauwel has in his project focussed on nanomaterials, synthesis and property studies. This Marie Curie (MC) project has provided stand alone results, in particular with respect to developing non-aqueous synthesis routes towards metallic nanoparticles like cobalt and nickel, however, also developing such routes towards oxide materials like hafnium oxide (HfO2) and CaHfO3. These efforts have been nicely integrated with tasks in the UiO project on sensor and imaging materials, where Dr Rauwel has worked in 1/3 position for a three year period. Luminiscence of nanoparticles have been explored with the objective to integrate these into thin films that may enhance temperature sensitivity for low-temperature thermal imaging. The atomic layer deposition (ALD) goals of Dr Rauwel in the current project, have partly been nicely interfaced with a project on coatings of mesoporous catalyst supports, a project on which Dr Rauwel has worked in 2/3 position for a period of three years. All these projects address application of nanostructured functional materials, from sensing to catalysis. The MC activities of Dr Rauwel - in combination with efforts in the other mentioned UiO projects - have led to two disclosures of invention, one of which has been passed on to the patenting stage.