Objectif Objectives and problems to be solved:The field of large area deposition of energy efficient optical coatings has been subject to many innovations. Starting in the 80s, the first generation of large area coatings has been realized by magnetron sputtering or large area CVD of coatings with modest emissivity in the range of 10 16 % decreasing the U-value of double glazing units from 3 W/(m² K) to 1.3 1.6 W/(m²K). A second generation of energy efficient layers has been developed in the middle of the 90s in order to fulfil more stringent laws regarding energy consumption. These layers exhibit emissivity of 4 %. Applied as low E coating on DGUs, U-value of about U 1.1 W/(m²K) can be achieved. Further decrease of U-value to 0.5 W/(m²K) can be realized for low emissivity coated vacuum glazing. The established 2nd generation low E coatings cannot be applied on these glazing, unfortunately, due to their poor thermal stability. Using the first generation pyrolytic low E coatings, on the other hand, gives rise to heat resistant coatings, but the gain in U value is poor. Vacuum coatings based on pyrolytic low E coatings on position 2 and 3 exhibit U-value of U = 0.9 W/(m²K) and thus, there is considerable interest in high performance temperable low E coatings to decrease the U-value of vacuum glazing to approx. 1/3 of U-value obtained for conventional DGUs.Description of the work:The key technology necessary to achieve these goals is the technology of large area magnetron sputtering from ceramic targets. This allows for deposition of new materials such as complex ternary and quaternary spinell type layers, which cannot be deposited using conventional reactive processes. We will investigate into the material science and process technology for deposition of ultra durable spinell type layers, which are the key components for the deposition of temperable low E coatings.The R&D work will be divided as follows:· Developing ceramic target materials suited for DC sputtering of ultra durable dielectric layers to be used in insulator-metal-insulator interference stacks.· Developing optimised process technologies for large area deposition of energy efficient coatings based on magnetron sputtering from ceramic targets.· Developing new layer stacks for temperable low E coatings to reach U = 0.5 W/(m² K) and high performance low E sun control coatings to be applied on vacuum glazing and double glazing units.· Transferring R&D results into pilot production.Expected results and exploitation plans:The main technical result will be a vacuum glazing which exhibits an U value of 0.5 W/(m²K) within a pilot production on large area substrates. The research on temperable high index materials will result in detailed knowledge on the properties of multi component oxide films to be used in architectural glazing. Due to the availability of U = 0.5 W/(m²K) technology, the green house effect can significantly be reduced. On the other hand, the research on multi component oxide layers can be exploited in other technological fields such as information display, photovoltaic and optoelectronics. Champ scientifique natural sciencesphysical scienceselectromagnetism and electronicsoptoelectronicsengineering and technologymaterials engineeringcoating and filmsengineering and technologymaterials engineeringceramicssocial scienceslaw Programme(s) FP5-EESD - Programme for research, technological development and demonstration on "Energy, environment and sustainable development, 1998-2002" Thème(s) 1.1.4.-6. - Key action Economic and Efficient Energy for a Competitive Europe Appel à propositions Data not available Régime de financement CSC - Cost-sharing contracts Coordinateur FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V. Contribution de l’UE Aucune donnée Adresse 54E,Biedenroder Weg 54E 38108 BRAUNSCHWEIG Allemagne Voir sur la carte Coût total Aucune donnée Participants (5) Trier par ordre alphabétique Trier par contribution de l’UE Tout développer Tout réduire APPLIED FILMS GMBH & CO. KG Allemagne Contribution de l’UE Aucune donnée Adresse Siemensstrasse 100 63755 ALZENAU Voir sur la carte Coût total Aucune donnée HERAEUS THIN FILM MATERIALS GMBH Allemagne Contribution de l’UE Aucune donnée Adresse Wilhelm-Rohn Strasse, 25 63450 HANAU Voir sur la carte Coût total Aucune donnée SEMCO GLASTECHNIK GMBH Allemagne Contribution de l’UE Aucune donnée Adresse Feldmark 8 17034 NEUBRANDENBURG Voir sur la carte Coût total Aucune donnée Scheuten Glasgroep BV Pays-Bas Contribution de l’UE Aucune donnée Adresse Groethofstraat 21 5900 Venlo Voir sur la carte Liens Site web Opens in new window Coût total Aucune donnée UPPSALA UNIVERSITY Suède Contribution de l’UE Aucune donnée Adresse REGEMENTSVAGEN 1 Uppsala Voir sur la carte Coût total Aucune donnée