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Content archived on 2024-06-18

Conduction Mechanisms in Advanced MOS Technologies

Objective

"Silicon-based technologies are approaching their physical limits, and technology breakthroughs, in terms of materials and processes, will be required as device sizes reach the nano-scale frontier. To face these challenges, a new generation of devices based on a clever combination of selected materials is currently under consideration worldwide. The aim of this project is to investigate the conduction mechanisms, in connection with degradation and breakdown characteristics, of Metal Gate/High-K structures on III-V substrates intended for applications in future MOS transistors. This aspect is primary obstacle to the successful incorporation into mainstream semiconductor process. To the date, no systematic study about these topics in such advanced structures has been carried out.
The project covers all aspect of conduction in the MG/HK/III-V stacks, fresh, stressed and, finally the breakdown event and the conduction over the degraded stacks. The electrical characterization will provide relevant information to contribute to the elaboration of models that are able to predict the life time of devices more accurately.
Leading the transition to advance electronics is a challenge for applied research as it requires specific technologies platforms. That is actually why this proposal is highly interesting. This research project would contribute to achieve excellence in the filed and consequently would attract the interest of the industrial sector of the EU. This proposal aims to define advantages and constrains of advance MG/HK/III-V stacks since they will play a relevant role in the next generation of CMOS manufacture process"

Fields of science (EuroSciVoc)

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Topic(s)

Calls for proposals are divided into topics. A topic defines a specific subject or area for which applicants can submit proposals. The description of a topic comprises its specific scope and the expected impact of the funded project.

Call for proposal

Procedure for inviting applicants to submit project proposals, with the aim of receiving EU funding.

FP7-PEOPLE-2011-IIF
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Funding Scheme

Funding scheme (or “Type of Action”) inside a programme with common features. It specifies: the scope of what is funded; the reimbursement rate; specific evaluation criteria to qualify for funding; and the use of simplified forms of costs like lump sums.

MC-IIF - International Incoming Fellowships (IIF)

Coordinator

TECHNION - ISRAEL INSTITUTE OF TECHNOLOGY
EU contribution
€ 250 106,00
Address
SENATE BUILDING TECHNION CITY
32000 Haifa
Israel

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Activity type
Higher or Secondary Education Establishments
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Total cost

The total costs incurred by this organisation to participate in the project, including direct and indirect costs. This amount is a subset of the overall project budget.

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