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Advanced lithography using ARF scanner 2

Objetivo

ALASCA2 aims at making an extensive investigation of the technical and lithographic performance of the first generation ASML PAS5500/900 193nm step-and-scan system for R&D and pilot production. Special attention will be given to the performance of the illumination system and the projection lens, and to the lifetime of optical components. The system will be assessed focusing on the 0.13 µm technology node, where 193 nm lithography may be inserted into semiconductor manufacturing.

Convocatoria de propuestas

Data not available

Coordinador

INTERUNIVERSITAIR MICRO-ELECTRONICA CENTRUM VZW
Aportación de la UE
Sin datos
Dirección
KAPELDREEF 75
3001 LEUVEN
Bélgica

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Coste total
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Participantes (9)