Obiettivo For the manufacturing of flat panel display and electrochromic devices, an high density Indium Tin Oxide (ITO) material and an improved sputtering system have been developed then tested at the preindustrial scale. These material and equipment enable to increase the utilization rate of the ITO sputtering targets without deteriorating the performances of the ITO thin films. The origin of black nodules that grow on the target surface during a sputtering operation and that lead to premature shutdown of the sputtering process has also been elucidated. The potential benefits that can be expected from this work are a reduction of the production costs of the flat panel display systems. The problem for the recycling of the ITO targets has also been studied and two recycling routes (for new scraps and for old scraps) have been proposed. These two recycling routes will enable a better management of the indium worldwide resources.For the manufacturing of flat panel displays, electrochromic glazings and other large area coating files, electrical conducting layers with a high degree of optical transmission are required. Indium-Tin-oxide (ITO) is the most commonly used material for such applications.The will of the research programme is to improve the ITO coating requirement (resistivity below 1.5 10-4 _cm, transmittance up to 98%, point effect density <100 cm-2) and the material efficiency (increase from 20% to >30% of the weight of the target used for coating and recovery of the scrap ITO).To comply with these objectives, the programme includes news:- Powder raw material development and preparation. - Target design and manufacturing. - Basic research on the sputtering process. - Magnetron study and design. - Recycling route development.Process scale up will be examinated and performances of pilot coated glass will te tested in end-products experimental devices. Campo scientifico engineering and technologyenvironmental engineeringwaste managementwaste treatment processesrecyclingnatural scienceschemical sciencesinorganic chemistrypost-transition metalsengineering and technologymaterials engineeringcoating and films Programma(i) FP3-BRITE/EURAM 2 - Specific programme (EEC) of research and technological development in the field of industrial and materials technologies, 1990-1994 Argomento(i) 2.2.2 - Manufacturing techniques for industrial use of advanced materials Invito a presentare proposte Data not available Meccanismo di finanziamento CSC - Cost-sharing contracts Coordinatore Métaleurop Recherche SA Contributo UE Nessun dato Indirizzo 1 avenue Albert Einstein 78193 Trappes Francia Mostra sulla mappa Costo totale Nessun dato Partecipanti (3) Classifica in ordine alfabetico Classifica per Contributo UE Espandi tutto Riduci tutto DEGUSSA AG Germania Contributo UE Nessun dato Indirizzo RODENBACHER CHAUSSEE 4 6450 SIGURD HANAU Mostra sulla mappa Costo totale Nessun dato LEYBOLD AG Germania Contributo UE Nessun dato Indirizzo SIEMENS STRAßE 100 8755 ALZENAU Mostra sulla mappa Costo totale Nessun dato SAINT GOBAIN Francia Contributo UE Nessun dato Indirizzo 39 QUAI LUCIEN LEFRANC 93303 AUBERVILLIERS Mostra sulla mappa Costo totale Nessun dato
