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RTD system: Plasma assisted vapour deposition

The Commission of the European Communities, Joint Research Centre, issues a restricted procedure call for the delivery of a state of the art research and development facility for plasma assisted chemical vapour deposition under microwave power. The system should include: A co...

The Commission of the European Communities, Joint Research Centre, issues a restricted procedure call for the delivery of a state of the art research and development facility for plasma assisted chemical vapour deposition under microwave power. The system should include: A cold wall with viewports; substrate RF bias voltage; microwave power supply; the possibility of working in electron cyclotron resonance mode; additional radiation heating of the parts; temperature controller; pumping system; gas supply system; programmable process control unit with data acquisition; all necessary safety installation. Tenders will be invited from preselected organizations in accordance with the financial regulations of the European Communities (OJ No L 356 of 31.12.1977). Candidates should submit evidence that they are not in a state of bankruptcy or liquidation or that their activities have not been stopped, etc. In addition they should verifiable references showing their capability to implement the order. General terms and conditions plus the specific tender conditions will be forwarded with the invitations to tender. Applications for consideration or for further details should be made to: Commission of the European Communities Common Centre for Research GCO PO Box 2 NL-1755 Petten Tel. +31-0-22465317; Fax +31-0-22461251

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