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High resolution analytical em

Objective

Improve current version of machine by

- improving the handling and equipping the tool with the proper load-lock, anticontaminator, and stage.

- simplifying operations with completely menu-driven parameter sets.

- adding missing link from inline review-stations to offline analysis.

- reducing maintenance frequency with a better performing contamination protection in the column.

This project will assess an analytical Scanning Electron Microscope (SEM) from LEO (ex-ZEISS), which offers a unique combination of state-of-the-art resolution in a low-voltage regime with the high-beam current of a Schottky heated field emission electron source. The advantage of this machine over the main competitors, Hitachi and Jeol, is a better signal-to-noise ratio and a significantly higher sensitivity in materials' analyses. The outcome of the project will be a machine upgraded to meet the online needs of defect/particle and failure analysis laboratories, today handled offline by the semiconductor manufacturers.

Funding Scheme

ACM - Preparatory, accompanying and support measures

Coordinator

SIEMENS AKTIENGESELLSCHAFT
Address
Wittelsbacherplatz 2
80333 Muenchen
Germany