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Content archived on 2024-04-30

Electron emission from ferroelectric thin films for application to flat panel displays

Objective

The first phase of the project will examine if emission from ferroelectric thin films can be used in principle for an FPD application. The objective of the second phase is the enhancement, optimisation and control of the emitted charge and the visualisation of the electrons. In parallel, miniaturisation will be performed in order to establish a micro electron beam of proper pixel size. The overall objective thus is the development of a micro electron source for individual pixel illumination.

The use of electron emission from ferroelectric thin films for flat panel display (FPD) applications could provide several advantages in comparison to existing techniques. For example, the simplification of display architecture, removal of the need for vacuum or plasma environments and faster response times at lower operating voltages. It is anticipated that the proposed demonstration of a micro electron source, based on emission from thin film ferroelectrics, will immediately trigger comprehensive R&D on a novel type of FPD.

The approach is based on knowledge of the emission mechanism, the emission characteristics of bulk ferroelectrics, and on the switching dynamics of ferroelectric thin films. Two groups of materials - ferroelectric and antiferroelectric - will be investigated while using different switching modes: First, switching within the ferroelectric state, and second, a transition from a non-polar to a ferroelectric phase. The films will be prepared by wet chemical methods which have the advantages of: easy processing, the free choice of stoichiometry and dopants, the possibility of depositing layers on large and/or non-planar substrates, low annealing temperatures.

Switching of the ferroelectrics will be examined using Sawyer-Tower hysteresis measurements for the low frequency testing and current hysteresis loop circuits for pulse measurements in the ns-range. In parallel, the structure of the top electrode grid will be optimised. Emission will be detected by a Photomultiplier or - at higher intensities - by a Faraday cup. Starting from the well known bulk phenomena, the thickness of the material will be reduced systematically down to a few µm. Two approaches are foreseen for visualisation: Illumination of a classical phosphor screen, or an electroluminescent layer directly attached to the emitter. Miniaturisation will be performed in order to achieve a proper pixel size.

At the end of the project, a micro electron source of simple multilayer structure and low operating voltage, which does not require a vacuum, will be available. Its main properties will be a current density above 10 mA/cm2 , repetition rates in the MHz region, and a spatial resolution of approximately 10 x 10 µm2. Integration of the display driver electronics, the emitter, and the screen is envisaged. The emitter would meet the main requirements for developing an array of sources and thus a laboratory model device of a future display can be proposed. This subsequent R&D project could propose an individual pixel addressed flat panel display based on emission from ferroelectric thin films.

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Funding Scheme

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ACM - Preparatory, accompanying and support measures

Coordinator

Universite de Nantes
EU contribution
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Address
Quai Tourville 1
44000 Nantes
France

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Total cost

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