Objective It is widely recognised within the electronics industry that plasma etching will play a vital role in achieving submicron technology, both in silicon and IIIVsemiconductor systems. The objective of this project was to gain a better understanding, by applying suitable diagnostics methods, of the complex chemistry and physics involved in plasma etching so that the knowledge gained could be applied to the manufacture of improved equipment and to process realisation. The objective of this project was to gain a better understanding, by applying suitable diagnostics methods, of the complex chemistry and physics involved in plasma etching so that the knowledge gained could be applied to the manufacture of improved equipment and to process realisation. The first part of the work was devoted to the development of measurement instrumentation and to equipment setup. In particular, an optical emission spectrometer and a quadrupole mass spectrometer were installed in a reaction chamber in order to detect the chemical species created when the etching reaction takes place. A reactive ion etching process was successfully established for a 0.5 micron structure size.The first part of the work was devoted to the development of measurement instrumentation and to equipment setup. In particular, an optical emission spectrometer and a quadrupole mass spectrometer were installed in a reaction chamber in order to detect thechemical species created when the etching reaction takes place. A reactive ion etching process was successfully established for a 0.5micron structure size. Exploitation The study of the reaction kinetics paves the way for an improved etching process to be designed which can be utilised as a term of reference by other industries because of the widespread research work. Already, as a result of this project, an advanced three-chamber plasma etching machine has been produced by one of the partners. This equipment is capable of processing 200 mm2 wafers with ICs designed with 0.5micron structure size. A prototype was shown at the Produktronika 87Fair in Munich, and commercialisation is expected. However, additional and upto-date etching processes are still needed for full exploitation of the machine's capabilities. The new optical spectrum analyser (including software) developed by Monolight is undergoing commercialisation. Fields of science natural sciencescomputer and information sciencessoftwarenatural sciencesphysical scienceselectromagnetism and electronicssemiconductivitynatural scienceschemical sciencesinorganic chemistrymetalloids Programme(s) FP1-ESPRIT 1 - European programme (EEC) for research and development in information technologies (ESPRIT), 1984-1988 Topic(s) Data not available Call for proposal Data not available Funding Scheme Data not available Coordinator Fraunhofer-Gesellschaft zur Förderungder Angewandten Forschung e.V. Address Dillenburgerstrasse 14199 Berlin Germany See on map EU contribution € 0,00 Participants (4) Sort alphabetically Sort by EU Contribution Expand all Collapse all Johnson Matthey plc United Kingdom EU contribution € 0,00 Address Orchard road SG8 5HE Royston See on map LEYBOLD HERAEUS GMBH Germany EU contribution € 0,00 Address Siemensstrasse 100 8755 Alzenau See on map Mono Light Instruments Ltd United Kingdom EU contribution € 0,00 Address 2-3 waterside KT15 2SN Weybridge See on map United Kingdom Atomic Energy Authority (UKAEA) United Kingdom EU contribution € 0,00 Address Harwell laboratory OX11 0RA Didcot See on map
