Periodic Reporting for period 2 - G4SEMI (Graphene for Semiconductor Industry)
Période du rapport: 2019-05-01 au 2020-04-30
The investigation of catalyst treatments, and the adjustment of growth parameters as well as some hardware design revisions, have allowed Graphenea to achieve 200mm scale graphene growth. It has been demonstrated that it is possible to achieve large area graphene on catalyst and on wafer.
Under the framework of a custom-made graphene integration scenario a modified transfer method has been defined. Graphene is successfully transferred to semiconductor substrates at 200mm scale. Polymeric and metal contaminants are critical to achieve graphene on wafer under the defined specifications.
A quality control protocol has been defined to ensure a batch to batch reproducibility of a standard graphene-on-wafer product.
During this first year we have established a dissemination plan to reach those audiences that can be interested in our scale up capacity and can work in collaboration with us to develop new CVD graphene on wafer applications. We have attended trade shows and conferences, and we have arranged face to face meetings with customers, to show our development to potential customers.
This will enable the introduction of graphene in industrial applications where the minimum scale is 200mm size.