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Demonstration of Concept for Ultrashort Cycle-Time Processing of Large-Scale ASICs

Objective

The overall goal of FAB 2000 is to assess and demonstrate the economical feasibility of a dedicated ASIC minifab that is characterised as an extremely flexible, ultrashort cycle time manufacturing line producing state-of-the-art CMOS and BiCMOS products using 0.45 micron/O.35 micron process technologies. This particular project acting as phase I of this activity, will conduct a validation of the concept.

The concept requirements will be defined and investigations will establish the strengths and weaknesses in Europe, and how gaps may be filled.

This work is essential to investigate ways of reducing the dramatically rising entry costs in the manufacture of advanced semiconductor technology products. The particular aim is to define a technology for the production of cost effective small volume ASICs in ultra short cycle times, but the results are also appropriate for use in larger volume lines providing a scalable low cost migration towards new process generations.

The work will include software simulation for single wafer lots and significant consideration of the methodology for integrated manufacture including automated process monitoring. Considerations will also include industry standards, open systems, mini-environments, cell control, advanced process control, smart sensors, human interfaces, and single wafer processing options. The final part of the project will produce specifications for the accepted minifab option, detailing the content of following phases.

Coordinator

EUROPEAN SILICON STRUCTURES SA
Address
Zone Industrielle
13106 Rousset
France

Participants (6)

ECOLE POLYTECHNIQUE FEDERALE DE LAUSANNE
Switzerland
Address
Des Fluides - Departement De Mecanique
1015 Lausanne
GEC Plessey Semiconductors plc
United Kingdom
Address
Cheney Manor
SN2 2QW Swindon
Grenoble Silicium Submicronique
France
Address
Centre D'étude De Grenoble Avenue Des Martyrs
38041 Grenoble
Integral Solutions Ltd (ISL)
United Kingdom
Address
3 Campbell Court Bramley
RG25 5EG Basingstoke
SIEMENS AG
Germany
Address
Wittelsbacherplatz
80333 Muenchen
TEXAS INSTRUMENTS DEUTSCHLAND GMBH
Germany
Address
Haggertystraße 11805
85356 Freising