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Content archived on 2024-04-16

DEVELOPMENT OF CVD, METALORGANIC PRECURSORS AND PATTERNING TECHNIQUES FOR HIGH TC APPLICATIONS

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Alkaline and rare earth metal complexes fully suitable for use in low pressure metal organic chemical vapour deposition (LP-MOCVD) processes in all equipment, including those employing conventional, heated bubbler, sources. It is the only technology currently providing stable, reliable and reproducible mass transport and, hence, deposition rates from conventional equipment. Alkaline earth metal complexes of form [M(RCOCHCOR)2L](R=perfluoroalkyl,L=polydentate O or N donor, typically polyether) can be: handled in air; evaporated completely without dissociation or decomposition at ambient pressures; fully thermally stable liquids at temperature of use as MOCVD source. Rare earth metal complexes of the form [M(RCOCHCOR)3L](R=But,L=4-alkylpyridine-N-oxide) offer the same advantages and are also fluorine free. The complex [Ba(C3F7COCHCOC3F7)2.CH3O(CH2CH2O)4CH3] has been used in a fully in situ process to deposit 300 nm thick yttrium boron carbon oxygen (YBCO) film on 8 mm x 8 mm SrTiO3 with Tc=92.9 K, Jc=0.9 MA cm{-2} measured by ac susceptibility. Reproducibility is good, as are the prospects for large area deposition. The complexes will additionally be useful in deposition of other electronic grade ceramics of commercial interest. This includes ferroelectric (BaTiO3), buffer layer or electrolyte (YSZ) and glasses doped with rare earth metals. The alkaline earth metal complexes may also be used to deposit fluorides as optical coatings and components for glasses.
AIXTRON offers complete technology in the field of chemical vapour deposition (CVD) thin film equipment, technology and processes. The technology includes III-V and II-VI semiconductor compound, carbide and nitride, diamond and oxide thin films. All peripherals, such as gas supply, gas monitoring, exhaust treatment, precursor technology, are available.

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