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The development of a Silicon Linewidth Standard

Objective



The objective of the project is to develop and produce, for subsequent dissemination to the European industry, a silicon (Si) wafer linewidth standard which can be used for the calibration of optical and electron-optical linewidth measurement devices.

The individual standards shall consist of 10 mm x 13 mm pieces of bare Si with a series of surface relief patterns (lines and trenches) with widths ranging from 10 mm down to 0.2 mm. The targeted accuracy of the calibration of the linewidths is better than +/- 0.02 mm.

3 sets of artefacts with structures depths equal to 0.1 0.5 and 1.0 mm respectively will be manufactured, each containing 25 nominally identical standards.

The capability to produce further standards on request will be retained for a period of 5 years following the completion of the project.

Funding Scheme

CSC - Cost-sharing contracts

Coordinator

Physikalisch-Technische Bundesanstalt
Address
Bundesallee 100
3300 Braunschweig
Germany

Participants (2)

Interuniversitair Mikro-Electronika Centrum VZW
Belgium
Address
Kapeldreef 75
3001 Heverlee
National Physical Laboratory (NPL)
United Kingdom
Address
Queen's Road
TW11 0LW Teddington