Objective Objectives and content Microfabrication is a combination of technologies for making structures of several micrometers and smaller in size. Microfabrication involves numerous cost intensive process steps. The extremely high cost of the equipment is a major setback for wider business activity in this field. In particular this presents a problem for small and medium-size companies working on numerous niche markets in the area of microfabrication for sensor, actuator, optical applications, repair of masks etc. This project aims to develop a novel technology for microfabrication based on direct structuring of surfaces with a jet of chemically active plasma only 80 nm in diameter or even less, with simultaneous in-situ imaging. The nanonozzle emitting the jet will scan over the surface thus forming a required structure. His highly innovative technology will eliminate many process steps and will therefore be better suited for a small scale or pilot production and prototype development of microelectro-mechanical systems or integrated optics. Direct fabrication of submicron-size structures of materials with required electronic properties will also be possible by the local plasma-solid reaction. This process will complement conventional lithography technologies for fabrication of microelectronic devices. The technology will also allow simultaneous microfabrication and imaging with resolution better than 50 nm through the detection of the shear force between the nanonozzle and the surface thus giving a new dimension in the process control. It will therefore be suitable for in-situ on the spot analysis of the crosssections of microdevices. The proposed project brings together two SMEs (one of which co-ordinates it) and two university groups in a multi-sectorial consortium. The partners working in the areas of plasma microfabrication and high-resolution microscopies have complementary expertise. Both SMEs are potential end-users: one of them is interested in implementing such a technology for repair of stencil masks and the other is interested in manufacturing equipment for novel technology. In the course of the project the nanonozzles will be developed and fabricated. The instrument for scanning the nozzle including feedback for distance regulation, control electronics and software will be made. Finally, direct structuring on the silicon surfaces of the features 80 nm and smaller in size and repair of intentionally created defects in stencil masks will be demonstrated. The potential of the technology for commercial application will be assessed. Fields of science natural sciencescomputer and information sciencessoftwarenatural sciencesphysical sciencesopticsmicroscopyengineering and technologyelectrical engineering, electronic engineering, information engineeringelectronic engineeringsensorsnatural scienceschemical sciencesinorganic chemistrymetalloids Keywords Nanotechnology Programme(s) FP4-BRITE/EURAM 3 - Specific research and technological development programme in the field of industrial and materials technologies, 1994-1998 Topic(s) 0203 - Reliability and quality of materials and products Call for proposal Data not available Funding Scheme CSC - Cost-sharing contracts Coordinator Omicron Vakuumphysik GmbH Address 78,idsteinerstrasse 78 65232 Taunusstein Germany See on map EU contribution € 0,00 Participants (3) Sort alphabetically Sort by EU Contribution Expand all Collapse all Ionen Mikrofabrikations Systeme GmbH. Austria EU contribution € 0,00 Address 3,schreygasse 3 1020 Wien See on map THE PROVOST, FELLOWS AND SCHOLARS OF THE COLLEGE OF THE HOLY AND UNDIVIDED TRINITY OF QUEEN ELIZABETH NEAR DUBLIN HEREINAFTER TRINITY COLLEGE DUBLIN Ireland EU contribution € 0,00 Address Trinity college dublin, college green 2 Dublin See on map Universität Gesamthochschule Kassel Germany EU contribution € 0,00 Address 40,heinrich-plett-str. 34109 Kassel See on map
