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Anisotropic metal nanoparticles for improved dielectric and optical devices

Objective



Objectives and content
The aim of this project is to develop high performance
thin films of anisotropic metallic nanoclusters embedded
in a dielectric host. The enhanced dielectric and
optical properties of these composites make them a
credible alternative to existing materials in well
identified industrial sectors such as thin film passive
components for electronics, e.g. planar capacitors with
ultrahigh capacitance values, integrated polarisers with
high extinction ratios or all-optical ultra-fast switches
with response times of a few picoseconds. The
Brite/Euram Area covered by this proposal is area 2
"Materials and Technologies for Product Innovation" in
its item 2.1 "Materials engineering".
The project will be developed in two stages. The first
one involves the material engineering and thus, the
development of the appropriate techniques to produce
anisotropic particles embedded in an insulator matrix,
with a controlled size, shape and tentation. Several
routes will be conducted in parallel to produce such
nanocomposite thin films in order to minimise the
technical risk. The second stage relates to the
optimisation of the dielectric and optical response of
the composite films for the applications envisaged.
Several metallic nanocrystals and hosts with different
dielectric constant and structure will be explored to
tailor the film properties to the specific application.
The expected targeted results include media with a
dielectric constant s 3 of 5,000 and tan s 2 of 0.1 at
300 kHz (for capacitors) and optical waveguides
exhibiting non-linear optical properties (a non-linear
third order susceptibility X3 > 10-8 esu, absorption
a<101 cm l and x<12 ps) or polarising effects with
extinction ratios > 30 dB and insertion losses <0.5 dB
(for all-optical ultrafast integrated switches or
integrated polarisers). Demonstrators are planned in the
two fields of applications in order to probe the
practical problems raised by the use of these
nanocomposite films in actual devices.
The consortium is formed by a manufacturer of capacitors
and a supplier of telecommunication systems, a research
organisation which brings expertise on dielectric and
optical thin films and three University Departments with
their proved skills on the production of nanoparticles by
ion implantation, their characterisation by electron
microscopy techniques and their modelling and surface
control, respectively. In the case of the manufacturer
of capacitors, it is essential to reduce dielectric layer
thickness or to increase the dielectric constant. In the
case of AAR the supplier of telecommunication systems,
who is also a manufacturer of electronic and
optoelectronic components, it is essential to produce low
cost DC-DC converters, optoelectronic passive components
and ultrafast switches with higher performances.

Funding Scheme

CSC - Cost-sharing contracts

Coordinator

CONSEJO SUPERIOR DE INVESTIGACIONES CIENTIFICAS
Address
121,Serrano 121
28071 Madrid
Spain

Participants (5)

Alcatel CIT S.A.
France
Address
Route De Marcoussis
91461 Marcoussis
MORGAN GROUP TECHNOLOGY LIMITED
United Kingdom
Address
Bewdley Road
DY13 8QR Stourport On Severn
UNIVERSITE PIERRE ET MARIE CURIE - PARIS VI
France
Address
Place Jussieu, 4
75252 Paris
UNIVERSITY OF SUSSEX
United Kingdom
Address
Falmer
BN1 9QT Brighton
Universität Gesamthochschule Kassel
Germany
Address
40,Heinrich-plett-strasse 40
34132 Kassel