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Content archived on 2024-05-27

Metal-induced crystallization and epitaxial deposition for thin, efficient and low-cost crystalline si solar cells - (METEOR)

Objective

The main challenge in the development of a thin-film crystalline silicon solar cell is to find an industrially applicable process for the deposition of polycrystalline silicon films of sufficient structural and electronic quality. In this project a two-step process is proposed as a novel approach: Preparation of large-grained Si seed layers on glass and ceramics by metal - induced crystallization (MIC) on which subsequently Si is epitaxially grown by electron cyclotron resonance chemical vapour deposition (low temperature path) and chemical vapour deposition (high temperature path). Targeting at an efficiency of 12% these layers will be used to make efficient solar cells. It is planned to present a mini-module with an efficiency of 10% by end of the project. This innovative approach could result in a crystalline Si thin-film technology with a cost potential below 1 Euro/Wp.

Fields of science (EuroSciVoc)

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Programme(s)

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Topic(s)

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Call for proposal

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Funding Scheme

Funding scheme (or “Type of Action”) inside a programme with common features. It specifies: the scope of what is funded; the reimbursement rate; specific evaluation criteria to qualify for funding; and the use of simplified forms of costs like lump sums.

CSC - Cost-sharing contracts

Coordinator

HAHN-MEITNER-INSTITUT BERLIN GMBH
EU contribution
No data
Address
Kekulestrasse 5
12489 BERLIN
Germany

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Total cost

The total costs incurred by this organisation to participate in the project, including direct and indirect costs. This amount is a subset of the overall project budget.

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Participants (3)

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