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Metal-induced crystallization and epitaxial deposition for thin, efficient and low-cost crystalline si solar cells - (METEOR)

Objective

The main challenge in the development of a thin-film crystalline silicon solar cell is to find an industrially applicable process for the deposition of polycrystalline silicon films of sufficient structural and electronic quality. In this project a two-step process is proposed as a novel approach: Preparation of large-grained Si seed layers on glass and ceramics by metal - induced crystallization (MIC) on which subsequently Si is epitaxially grown by electron cyclotron resonance chemical vapour deposition (low temperature path) and chemical vapour deposition (high temperature path). Targeting at an efficiency of 12% these layers will be used to make efficient solar cells. It is planned to present a mini-module with an efficiency of 10% by end of the project. This innovative approach could result in a crystalline Si thin-film technology with a cost potential below 1 Euro/Wp.

Funding Scheme

CSC - Cost-sharing contracts

Coordinator

HAHN-MEITNER-INSTITUT BERLIN GMBH
Address
Kekulestrasse 5
12489 Berlin
Germany

Participants (3)

INTERUNIVERSITAIR MIKRO-ELEKTRONICA CENTRUM VZW
Belgium
Address
Kapeldreef 75
3001 Heverlee
KATHOLIEKE UNIVERSITEIT LEUVEN
Belgium
Address
2,Kasteelpartk Arenberg, 44
3001 Heverlee
VIENNA UNIVERSITY OF TECHNOLOGY
Austria
Address
8,Karlsplatz 13
1040 Wien