Skip to main content

Development of an optimized integrated thin film silicon solar module (DOIT)

Objective

This project aims at the development of an innovative silicon thin film solar module, exhibiting a stabilised active area efficiency of 11% on a substrate size of 30x30 cm2. The device consists of an amorphous silicon/microcrystalline silicon tandem solar cell (micro morph cell) prepared on a low cost TCO coated glass substrate. In view of industrial production, a deposition rate of at least 4 angstrom/s will be achieved for the intrinsic layer of the µc-Si:H bottom cell. Besides the scale-up of state-of-the-art small area micro morph cells prepared by Very High Frequency Glow Discharge, an alternative approach will be followed using lower excitation frequencies, which are more compatible with current a-Si:H production technology. The developments include the module fabrication technology and efficient light trapping schemes. Appropriate characterisation techniques and implementation of advanced plasma control tools will ensure a successful scale-up.

Funding Scheme

CSC - Cost-sharing contracts

Coordinator

University of Patras
Address
University Campus
26500 Patras
Greece

Participants (6)

CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE
France
Address
Route De Saclay Ecole Polytechnique
91128 Palaiseau
FORSCHUNGSZENTRUM JUELICH GMBH
Germany
Address

52425 Juelich
FREE ENERGY EUROPE SA
France
Address
Rue Léon-droux 2
62302 Lens
INSTITUTE OF PHYSICS - ACADEMY OF SCIENCES OF THE CZECH REPUBLIC
Czechia
Address
10,Cukrovarnicka 10
162 00 Praha 6
RWE SCHOTT SOLAR GMBH
Germany
Address
Hermann-oberth Strasse 11
85640 Putzbrunn
UNIVERSITE DE NEUCHATEL
Switzerland
Address
1,Rue A.-l. Brequet 2
2000 Neuchatel