The aim of the work is to transfer the well-known energy-dispersive time-of-flight neutron reflectometry technique to a X-ray reflection technique. Based upon this measuring method a novel, industrial energy-dispersive X-ray reflectometer should be developed. Using this novel X-ray reflectometer faster analysis of thin film systems should be possible compared to nowadays used angular-dispersive X-ray
reflectometers. This new reflectometer will be based on the already commercially available angular-dispersive industrial Siemens D5000 X-ray reflectometer with laboratory sealed X-ray tubes.
Because of faster measuring times and other specific advantages this new reflectometer will be a suitable tool to study in situ structural changes at surfaces and interfaces and respectively to allow fast routine process controls in glass industries or in semiconductor industries which is not possible with already commercially available X-ray reflectometers. The development will be done in close collaboration with Siemens Analytical X-ray Instruments, development department, Siemens AG, Karlsruhe (DE).