Objective The project concerns the development and use of laser diagnostics to study the kinetic of radicals in CH4, SiH4, NH3, H2 glow discharges. First, laser-induced fluorescence will be used to detect SiH and CH radicals in realistic conditions of Si and C film depositions. The results will be normalized with previously obtained mass spectrometry radical measurements. Second, a new laser system based on diode-laser injection-seeded optical parametric oscillator will be developed to detect hydrogen atoms using two-photon absorption laser-induced fluorescence. This diagnostic will be used to determined the H atom concentration profiles in the plasma. The influence of the nature of the substrate on the atom concentration will lead to the determination of surface loss probabilities. These measurements will complement the results previously obtained using other diagnostic techniques like optical emission, masse spectrometry and coherent anti-Stokes Raman scattering. Finally, experimental data will be used to interactively validate numerical models currently developed in the laboratory. Fields of science natural scienceschemical sciencesanalytical chemistrymass spectrometrynatural sciencesphysical sciencesopticslaser physics Programme(s) FP4-TMR - Specific research and technological development programme in the field of the training and mobility of researchers, 1994-1998 Topic(s) 0302 - Post-doctoral research training grants TP05 - Fluids and Plasmas Call for proposal Data not available Funding Scheme RGI - Research grants (individual fellowships) Coordinator Centre National de la Recherche Scientifique Address Fort de palaiseau 91120 Palaiseau France See on map EU contribution € 0,00 Participants (1) Sort alphabetically Sort by EU Contribution Expand all Collapse all Not available Germany EU contribution € 0,00 Address See on map
