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Study of thin dielectrics films by scanning thermal microscopy and complementary techniques

Objective



Research objectives and content
The question of power dissipation is a challenging issue for ULSI microelectronics power devices. The purpose of the project is to study thermal properties of very thin dielectrics films by a new and promising nanotechnique: scanning thermal microscopy. The study will involve the development of the thermal microscope, focusing on the reliability of measurements and the microscope capability to yield quantitative information on thin layers thermal properties. After testing the microscope on simple and well-known samples, thin layer of dielectrics, chosen for their potential applications in power devices, will be studied. These samples will also be characterised with different techniques: other scanning probe microscopy, nuclear and optical techniques, to obtain a complete knowledge of their physical and chemical properties. Training content (objective, benefit amd expected impact)
The project requires experimental skills and leads to the development of a new characterization method of very thin films implying a clear comprehension of the involved physical phenomena. This will greatly extend my competence to the field of nanotechnology as well as deepen my knowledge of thin films.
Links with industiy / industrial relevance (22)
The project is conducted in close collaboration with the SGS-Thomson site of Agrate Bianza (MI) where the MDM laboratory is located. This special situation favores technological transfert from university research laboratory to microelectronics industry.

Funding Scheme

RGI - Research grants (individual fellowships)

Coordinator

ITALIAN INSTITUTE FOR THE PHYSICS OF MATTER
Address
Via C. Olivetti 2
20041 Agrate Brianza
Italy

Participants (1)

Not available
France