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Content archived on 2024-04-30

Laser MATTER INTERACTION AND NON LINEAR PROCESSES: HIGH RESOLUTION SPECTROSCOPY IN THE TIME AND FREQUENCY DOMAINS

Objective



The Ultraviolet Laser Facility (U.L.F.) operates at FO.R.T.H. in Crete Greece. It provides a combination of state of the art laser systems workstations and local scientific expertise capable of supporting demanding research projects requiring access to modern short wavelength laser technology. Access is currently provided in three major facilities: Facility A incorporates laser systems offering extended tunability from the IR to the XUV region of the spectrum in short or ultrashort (femtosecond) pulse duration. Workstations involving atomic or molecular beam apparatus in combination with mass and electron energy analysers appropriate for a variety of analytical applications and chemical dynamics studies can be used. Facility A also offers CW laser systems together with equipment appropriate for dynamie light scattering studies. Facility B includes a high peak power laser, (focused intensities of ca 10exp16W/cm2) emitting ultrashort pulses at 248 nm in a unique low pedestral radiation background. Sophisticated mass and photoelectron spectrometers and optical detection equipment permit the study of intense field phenomena Femtosecond pulse lasers operating at lower intensities and high repetition rate in combination with ultrafast detection systems (autocorrelators and streak cameras) allow the observation of ultrafast phenomena.
Facility C provides access to excimer lasers workstations and diagnostic systems appropriate for novel material processing applications of industrial Interest. In particular, workstations for thin film deposition (Pulsed Laser Deposition and Laser Chemical Vapor Deposition) and Micromachining may be used for a variety of materials including metals. ceramics and optical fibers. Recently, a Molecular Beam Epitaxy (MBE) apparatus appropriate for the epitaxial growth of semiconductor materials is available together with an ultraviolet laser for on line processing. U.L.F. is currently partner in an Association of European Laser Facilities including LENS (Florence Italy). LIF-ENSTA-X (Paris. France). LLC (Lund Sweden) and MBI (Berlin, Germany). The benefit of this Association is the optimal use of European resources and their synergy in terms of meeting user needs. The establishment of a unified selection panel, coordination of publicity and other activities will optimize the use of the available infrastructure. Furthermore, this collaborative effort is expected to have a long term impact in promoting scientific mobility within the EU. This proposal aims to extend access to U. L. F. from EU researchers starting from 1996. Access to the facilities will be offered together with support from U. L F. personnel for 7()() man days per year.

Call for proposal

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Coordinator

FOUNDATION OF RESEARCH AND TECHNOLOGY - HELLAS
EU contribution
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Address
Vasilika Vouton
71110 IRAKLION
Greece

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Total cost
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