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Content archived on 2024-05-14

Advanced photomask cleaning

Objective

To integrate and evaluate the ASC 500 cleaner as one of the most important tools in the mask making process for production masks meeting the requirements of 0.25um wafer technology.

To prove the process quality of the ASC 500 (zero defects larger than 0.20um) mean time to failure (MTTF) and mean time to repair (MTTR).

For the evaluation of the ASC 500, a variety of masks (production masks and special test masks) with differing applications (CMOS/ASICs/Logic), mask types (Binary/ Phase shift masks) and production methods (E-beam/ Laser writing) will be used.

The goal of this project is the assessment of Steag HamaTech`s newly developed automated photomask cleaner (cassette to cassette) ASC 500. The assessment is to be carried out at the Siemens Mask Shop with masks for different applications.

The result of the assessment of the ASC 500 will be a benchmark showing best of breed features: process performance, yield, reliability, uptime, cycle-time and cost-of-ownership.

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Call for proposal

Data not available

Coordinator

SIEMENS AKTIENGESELLSCHAFT
EU contribution
No data
Address
WITTELSBACHERPLATZ 2
80333 MUENCHEN
Germany

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Total cost
No data