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Innovative techniques for deposition of hard carbon nitride

Objective


Foreseen Results

Development of optimised techniques for deposition of carbon nitride materials.
High quality carbon nitride materials as regarding the structure, stability, hardness and tribological properties will be obtained.
There is an increase need in industry for protective layers with high hardness and good tribological and chemical resistive properties. A new potential candidate for applications in this field is the carbon nitride. The project is intended to develop new techniques of deposition for this material. The approach will make use of expanding plasma sources. These plasma sources have been developed as reliable devices. The plasma sources used by the different partners in the project are complementary in properties and are very effective in producing excited particles and radicals of adjusted amounts and states leading to high growth rates.
During the project techniques will be employed in which the above mentioned sources will be developed together with various methods in which the carbon particles should be either injected (as fullerenes or graphite powder) or directly produced (sputtering, evaporation) in a flowing plasma containing excited nitrogen. The plasma sources should be optimized on their parameters, so as to satisfy the processing criteria (plasma radicals/ions composition and energies; plasma density). This will be done by means of detailed plasma parameter measurements in combination with modelling of the different plasma sources. The different plasma diagnostics available in the project are mass spectrometry, optical emission spectroscopy, Langmuir probe and active Iaser spectroscopy such as laser induced fluorescence.
The techniques developed for manufacturing films and coatings using the optimized plasma sources will be investigated in order to establish the favourable conditions for depositing high quality carbon nitride. Continuous monitoring of the properties of the deposited layers will be done. Film analysis techniques available are e.g. infrared absorption spectroscopy, X-ray photoelectron spectroscopy, spectroscopic ellipsometry, X-ray diffraction, atomic force microscopy. Hardness will be determined using nano-indentation measurements.
Finally a comparision of the different techniques used and results obtained will be performed. The quality of carbon nitride films obtained, the problem of scaling up and cost estimates for a transfer to industry will be evaluated.

Funding Scheme

CSC - Cost-sharing contracts

Coordinator

Technische Universiteit Eindhoven
Address

5600 MB Eindhoven
Netherlands

Participants (4)

Ecole Polytechnique
France
Address

91128 Palaiseau
Kurchatov Institute of Atomic Energy
Russia
Address
Kurchatov Square
123182 Moskva
National Institute for Lasers, Plasmaand Radiation Physics
Romania
Address
1,Atomistilor Street 1
76900 Bucuresti
University of Bucharest
Romania
Address

76900 Bucuresti