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Content archived on 2022-12-23

Electronic Structure of Transition Metal Silicides and Buried Solid-Solid Interfaces

Objective



The study of electronic structure of 4d and 5d-transition metal silicides and buried solid-solid interfaces will be undertaken by XES, XPS and band structure calculations. Special attention will be paid for study of interfaces in transition metal/silicon system in dependence of heat treatment, ternary transition metal silicides prepared by ion-beam synthesis in dependence of fluence and irradiation conditions, Si/SiO2 system irradiated by high-energy electrons, TiO2/SiO2 and SiO2/Al2O3 system. The XES and XPS methods will be developed for quantitative analysis of chemical reactions and phases distribution in interfaces in depth. These methods will be applied for characterization of semiconducting devices (Ir-Si infrared detectors). The obtained results will be presented as scientific papers.

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Funding Scheme

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Coordinator

Universität Osnabrück
EU contribution
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Address

49069 Osnabrück
Germany

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Total cost

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Participants (1)

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