Advanced lithography using ARF scanner 2

Objective

ALASCA2 aims at making an extensive investigation of the technical and lithographic performance of the first generation ASML PAS5500/900 193nm step-and-scan system for R&D and pilot production. Special attention will be given to the performance of the illumination system and the projection lens, and to the lifetime of optical components. The system will be assessed focusing on the 0.13 µm technology node, where 193 nm lithography may be inserted into semiconductor manufacturing.

Programme(s)

• FP5-IST - Programme for research, technological development and demonstration on a "User-friendly information society, 1998-2002"

Topic(s)

• 1.1.2.-4.8.3 - Processes, equipment and materials

Call for proposal

Data not available

Funding Scheme

ACM - Preparatory, accompanying and support measures

Coordinator

INTERUNIVERSITAIR MICRO-ELECTRONICA CENTRUM VZW

Address

Kapeldreef 75
3001 Leuven
Belgium

 

Participants (9)

ASM LITHOGRAPHY B.V.

Netherlands

Address

De Run 1110
5503 LA Veldhoven

 

CYPRESS SEMICONDUCTOR

United States

Address

3901 N. First Street
95134 San Jose

 

INFINEON TECHNOLOGIES AG

Germany

Address

St. Martin Strasse 53
81609 Muenchen

 

INTEL CORPORATION

United States

Address

Mission College Boulevard 2200
95052 Santa Clara Ca

 

MICRON TECHNOLOGY INC.

United States

Address

8000 South Federal Way
83707-0006 Boise, Idaho

 

MOTOROLA INC.

United States

Address

3501 Ed Bluestein Boulevard
78721 Austin - Texas

 

PHILIPS SEMICONDUCTORS B.V.

Netherlands

Address

Professor Holstlaan 4
5656AA Eindhoven

 

SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC.

Japan

Address

292 Yoshida-cho, Totsuka-ku
244-0817 Yokohama

 

TEXAS INSTRUMENTS INCORPORATED

United States

Address

Forest Lane 8505
75266 Dallas Tx