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Advanced lithography using ARF scanner 2

Objective

ALASCA2 aims at making an extensive investigation of the technical and lithographic performance of the first generation ASML PAS5500/900 193nm step-and-scan system for R&D and pilot production. Special attention will be given to the performance of the illumination system and the projection lens, and to the lifetime of optical components. The system will be assessed focusing on the 0.13 µm technology node, where 193 nm lithography may be inserted into semiconductor manufacturing.

Call for proposal

Data not available

Coordinator

INTERUNIVERSITAIR MICRO-ELECTRONICA CENTRUM VZW
Address
Kapeldreef 75
3001 Leuven
Belgium
 

Participants (9)

ASM LITHOGRAPHY B.V.
Netherlands
Address
De Run 1110
5503 LA Veldhoven
 
CYPRESS SEMICONDUCTOR
United States
Address
3901 N. First Street
95134 San Jose
 
INFINEON TECHNOLOGIES AG
Germany
Address
St. Martin Strasse 53
81609 Muenchen
 
INTEL CORPORATION
United States
Address
Mission College Boulevard 2200
95052 Santa Clara Ca
 
MICRON TECHNOLOGY INC.
United States
Address
8000 South Federal Way
83707-0006 Boise, Idaho
 
MOTOROLA INC.
United States
Address
3501 Ed Bluestein Boulevard
78721 Austin - Texas
 
PHILIPS SEMICONDUCTORS B.V.
Netherlands
Address
Professor Holstlaan 4
5656AA Eindhoven
 
SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC.
Japan
Address
292 Yoshida-cho, Totsuka-ku
244-0817 Yokohama
 
TEXAS INSTRUMENTS INCORPORATED
United States
Address
Forest Lane 8505
75266 Dallas Tx