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Content archived on 2024-04-16

Development of a photomask linewidth standard

Objective



The objective of the project is to produce a photomask linewidth calibration standard covering the dimensional range 0.20 um up to 50 um, with a 95% confidence level uncertainty in the calibration of lines of at least +/- 0.02 um in the 0.2 um up to 10 um range, and of at least +/- 0.05 um in the 10 um to 50 um range. The standard, to be fabricated in high density chromium (optical density greater than 2.5 at 450 nm) on a fused quartz plate coated with a conducting layer, is to be suitable for use in both optical and electron beam systems. Initially, ten artefacts will be manufactured, three of these being calibrated and retained by the Commission, the National Physical Laboratory (NPL) and the Physikalisch-Technische Bundesanstalt (PTB).

Status:
The work is in progress.

Topic(s)

Data not available

Call for proposal

Data not available

Coordinator

National Physical Laboratory (NPL)
EU contribution
No data
Address
Queen's Road
TW11 0LW Teddington
United Kingdom

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Total cost
No data

Participants (4)