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Development of a photomask linewidth standard

Objective



The objective of the project is to produce a photomask linewidth calibration standard covering the dimensional range 0.20 um up to 50 um, with a 95% confidence level uncertainty in the calibration of lines of at least +/- 0.02 um in the 0.2 um up to 10 um range, and of at least +/- 0.05 um in the 10 um to 50 um range. The standard, to be fabricated in high density chromium (optical density greater than 2.5 at 450 nm) on a fused quartz plate coated with a conducting layer, is to be suitable for use in both optical and electron beam systems. Initially, ten artefacts will be manufactured, three of these being calibrated and retained by the Commission, the National Physical Laboratory (NPL) and the Physikalisch-Technische Bundesanstalt (PTB).

Status:
The work is in progress.

Funding Scheme

CSC - Cost-sharing contracts

Coordinator

National Physical Laboratory (NPL)
Address
Queen's Road
TW11 0LW Teddington
United Kingdom

Participants (4)

Dupont Photomask SA
France
Address
Rue Olivier Perroy
13790 Rousset
National Microelectronics Research Center
Ireland
PHYSIKALISCH-TECHNISCHE BUNDESANSTALT
Germany
Address
Bundesallee 100
Braunschweig
Rutherford Appleton Laboratory (RAL)
United Kingdom
Address
Chilton
OX11 0QX Didcot