The objective of the project is to produce a photomask linewidth calibration standard covering the dimensional range 0.20 um up to 50 um, with a 95% confidence level uncertainty in the calibration of lines of at least +/- 0.02 um in the 0.2 um up to 10 um range, and of at least +/- 0.05 um in the 10 um to 50 um range. The standard, to be fabricated in high density chromium (optical density greater than 2.5 at 450 nm) on a fused quartz plate coated with a conducting layer, is to be suitable for use in both optical and electron beam systems. Initially, ten artefacts will be manufactured, three of these being calibrated and retained by the Commission, the National Physical Laboratory (NPL) and the Physikalisch-Technische Bundesanstalt (PTB).
The work is in progress.
Funding SchemeCSC - Cost-sharing contracts
OX11 0QX Didcot