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Content archived on 2024-04-16

Measurement of submicron semiconductor junction depths and width

Objective



The quantitative determination of junction depths and lateral outdiffusion lengths as well as the measurement of carrier concentration form an essential part in the control of semiconductors processing. In this project the spreading resistance technique (SRP) for the determination of Si structures of:

- junction depths,
- lateral spreading with outdiffusion lengths
- carrier concentrations,

will be extended in resolution down to the nanometre range and improved in view of its possible standardisation.

Status:
The work is in progress.

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Call for proposal

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Funding Scheme

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CSC - Cost-sharing contracts

Coordinator

Interuniversitair Microelectronica Centrum
EU contribution
No data
Address


Belgium

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Total cost

The total costs incurred by this organisation to participate in the project, including direct and indirect costs. This amount is a subset of the overall project budget.

No data

Participants (2)

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