Electroplating of refractory metals from halide melts is described in the literature. The basic chemistry and electrochemistry of such processes are not well understood. In the present project, we will try to investigate the effect of complexing the refractory metal ion by halide and oxygen ions on the process of electrochiometry and stability of the halide-oxygen complexes will be studied by Raman. IR spectroscopy and impedance spectroscopy together with oxide solubility, freezing point and emf measurements. In addition it is aimed to control the reaction mechanism and morphology of the metal deposition influenced by the melt composition by impedance spectroscopy.