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STRUCTURE OF REFRACTORY METAL HALIDE AND OXIHALIDE COMPLEXES IN ALKALI HALIDE MELTS AND THEIR INFLUENCE OF THE REFRACTORY METAL ELECTROCRYSTALLIZATION

Objective



Electroplating of refractory metals from halide melts is described in the literature. The basic chemistry and electrochemistry of such processes are not well understood. In the present project, we will try to investigate the effect of complexing the refractory metal ion by halide and oxygen ions on the process of electrochiometry and stability of the halide-oxygen complexes will be studied by Raman. IR spectroscopy and impedance spectroscopy together with oxide solubility, freezing point and emf measurements. In addition it is aimed to control the reaction mechanism and morphology of the metal deposition influenced by the melt composition by impedance spectroscopy.

Coordinator

Foundation for Research and Technology-Hellas
Address
Stadiou 18, Platani
26500 Patras
Greece

Participants (1)

UNIVERSITAET KARLSRUHE (TECHNISCHE HOCHSCHULE)
Germany
Address
Kaiserstrasse 12
76128 Karlsruhe