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Hydrophobic Ionic Liquid Technologies

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A comparison of choline:urea and choline:oxalic acid deep eutectic solvents at 338 K

Author(s): Mark Gilmore, Leila M. Moura, Adam H. Turner, Małgorzata Swadźba-Kwaśny, Samantha K. Callear, Jade A. McCune, Oren A. Scherman, John D. Holbrey
Published in: The Journal of Chemical Physics, Issue 148/19, 2018, Page(s) 193823, ISSN 0021-9606
DOI: 10.1063/1.5010246