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Ultra-versatile Structural PRINTing of amorphous and tuned crystalline matter on multiple substrates

Objective

Thin film deposition methods are crucial to generate progress in Key Enabling Technologies (KETs) of strategic importance for Europe, including Advanced Materials, Nanotechnology, Micro- and Nanoelectronics, Biotechnology, and Photonics. Devices like photovoltaic cells, light emitting diodes, electronic and optoelectronic micro-/nano-sensors are prominent examples of thin film applications where the precise control of material deposition and its degree of order (crystallinity) are of paramount importance for their performance and function. However, technologies for thin film deposition have very limited capacity to tune the material crystallinity at room temperature and atmospheric pressure, or to create functional 3D architectures in a single and versatile manner. The requirement of high temperatures and vacuum conditions make them inherently costly and unsuitable for deposition on various substrates (e.g. plastics). Moreover, their dimensions are not compatible with miniaturization and integration in table-top interfaces that would broaden their potential use. These limitations restrain the development of ground-breaking functional materials and new-conceptual devices. The absence of a radically new deposition technology hampers innovation and the appearance of new and cost-effective marketable products. Therefore, it is of utmost importance to develop a radically new deposition technology to overcome these limitations, and that is at the core of the SPRINT project. SPRINT will develop a universal deposition technology of amorphous and tuned crystalline matter on multiple substrates, at room temperature and pressure. This technology not only combines the benefits of existing advanced deposition methods, at significantly lower cost and higher deposition rates, but also goes beyond the state-of-the-art in advanced materials development, to open new roadmaps to a plethora of future devices and applications.

Field of science

  • /natural sciences/earth and related environmental sciences/atmospheric sciences/meteorology/atmospheric pressure
  • /humanities/arts/modern and contemporary art/film
  • /engineering and technology/nanotechnology
  • /engineering and technology/nanotechnology/nanoelectronics

Call for proposal

H2020-FETOPEN-1-2016-2017
See other projects for this call

Funding Scheme

RIA - Research and Innovation action

Coordinator

CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE CNRS
Address
Rue Michel Ange 3
75794 Paris
France
Activity type
Research Organisations
EU contribution
€ 470 151,25

Participants (7)

AGENCIA ESTATAL CONSEJO SUPERIOR DEINVESTIGACIONES CIENTIFICAS
Spain
EU contribution
€ 299 837,50
Address
Calle Serrano 117
28006 Madrid
Activity type
Research Organisations
EIDGENOESSISCHE TECHNISCHE HOCHSCHULE ZUERICH
Switzerland
EU contribution
€ 435 375
Address
Raemistrasse 101
8092 Zuerich
Activity type
Higher or Secondary Education Establishments
UNIVERSIDADE DO PORTO
Portugal
EU contribution
€ 394 543,75
Address
Praca Gomes Teixeira
4099 002 Porto
Activity type
Higher or Secondary Education Establishments
TECHNISCHE UNIVERSITAET GRAZ
Austria
EU contribution
€ 300 452,50
Address
Rechbauerstrasse 12
8010 Graz
Activity type
Higher or Secondary Education Establishments
KATHOLIEKE UNIVERSITEIT LEUVEN
Belgium
EU contribution
€ 299 687,50
Address
Oude Markt 13
3000 Leuven
Activity type
Higher or Secondary Education Establishments
CENTER FOR TECHNOLOGY RESEARCH ANDINNOVATION (CETRI) LTD
Cyprus
EU contribution
€ 399 937,50
Address
77, John Kennedy Avenue
1077 Nicosia
Activity type
Private for-profit entities (excluding Higher or Secondary Education Establishments)
CREATIVE NANO PC
Greece
EU contribution
€ 400 012,50
Address
Leventi 4
12132 Peristeri
Activity type
Private for-profit entities (excluding Higher or Secondary Education Establishments)