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InP on SiN Photonic Integrated circuits REalized through wafer-scale micro-transfer printing

Objective

INSPIRE aims to revolutionize photonic integrated circuit technology by combining two technologies, InP photonics and SiN photonics, in a single platform through wafer-scale micro-transfer printing technology. This platform will allow to combine high-performance III-V opto-electronic components (semiconductor optical amplifiers, high-speed phase modulators and photodetectors) operating in the C-band with the high-performance passive functionality of the SiN platform (high performance filters, 5dB/m waveguide loss), on 200mm wafers. The micro-transfer printing integration approach enables high-throughput integration of III-V devices on SiN photonic integrated circuits with better than 1 um alignment accuracy, resulting in high-performance, low-cost photonic integrated circuits. While being applicable in a wide range of mega-markets, the INSPIRE technology will be validated by three use cases: the case of a distributed fiber sensing readout unit based, the case of a microwave photonics RF pulse generator and a datacenter switch fabric. Compact models of the III-V opto-electronic components will be developed enabling designers to exploit this platform for a wide range of applications. INSPIRE will sustain Europe’s industrial leadership in photonics by combining the generic integrated foundry technology at the pioneering pure-play foundry SmartPhotonics, and the silicon photonics pioneer IMEC, with the micro-transfer printing technology at X-Celeprint, making this a world-first platform combining the strengths of all known PIC manufacturing platforms. It will also strengthen the European manufacturing base by developing and implementing processing steps that are key to removing expensive assembly steps in photonic IC based product realization. The methods will be developed for silicon nitride – indium phosphide integration. Since the optical coupling happens through a silicon intermediate layer the developed technology can be ported to silicon CMOS photonics as well.

Field of science

  • /natural sciences/physical sciences/electromagnetism and electronics/optoelectronics
  • /natural sciences/chemical sciences/inorganic chemistry/inorganic compounds

Call for proposal

H2020-ICT-2020-2
See other projects for this call

Funding Scheme

RIA - Research and Innovation action

Coordinator

TECHNISCHE UNIVERSITEIT EINDHOVEN
Address
Groene Loper 3
5612 AE Eindhoven
Netherlands
Activity type
Higher or Secondary Education Establishments
EU contribution
€ 907 903,75

Participants (6)

INTERUNIVERSITAIR MICRO-ELECTRONICA CENTRUM
Belgium
EU contribution
€ 1 490 668,75
Address
Kapeldreef 75
3001 Leuven
Activity type
Research Organisations
SMART PHOTONICS BV
Netherlands
EU contribution
€ 493 250
Address
High Tech Campus 29
5656 AE Eindhoven
Activity type
Private for-profit entities (excluding Higher or Secondary Education Establishments)
AMIRES SRO
Czechia
EU contribution
€ 261 250
Address
Stavitelska 1099/6
160 00 Praha 6
Activity type
Private for-profit entities (excluding Higher or Secondary Education Establishments)
X-CELEPRINT LIMITED
Ireland
EU contribution
€ 711 825
Address
6Th Floor 2 Grand Canal Square
D02 A342 Dublin
Activity type
Private for-profit entities (excluding Higher or Secondary Education Establishments)
THALES
France
EU contribution
€ 667 238,75
Address
Tour Carpe Diem Place Des Corolles Esplanade Nord
92400 Courbevoie
Activity type
Private for-profit entities (excluding Higher or Secondary Education Establishments)
THE CHANCELLOR MASTERS AND SCHOLARSOF THE UNIVERSITY OF CAMBRIDGE
United Kingdom
EU contribution
€ 450 145,50
Address
Trinity Lane The Old Schools
CB2 1TN Cambridge
Activity type
Higher or Secondary Education Establishments