Project description
Novel light interference harnesses the strength in diversity
Interference is generally a term that brings negative connotations to mind. However, interference patterns caused by merging two or more types of waves from the electromagnetic spectrum can be quite valuable. Interferometers harnessing this principle are used in many fields of science and engineering when trying to get a closer look at the composition of materials. The EU-funded LIM project is bringing to market an advanced large-area interferometric imager. Its ability to characterise materials samples down to a few atomic layers of sensitivity, combined with its potential compact size, could revolutionise in-line inspection in critical areas including semiconductors and photonics.
Objective
The proposed project aims at applying and exploiting a novel type of imaging technology, a large area interferometric imager (LIM), which was largely developed within the FET project Q-MIC. More specifically, we will analyse customer-relevant samples, evaluate the performance of prototypes in industrial environments and potentially adapt them to specific needs, and finally perform full market assessment and commercialization plan for the proposed technology. This in close collaboration with companies, which have already shown interest in using the technology as measurement, inspection tool or integrating it into their existing imaging systems. The LIM allows imaging of large sample areas and volumes with unprecedented sensitivities (a few atomic layers of material). Thanks to a close reference scheme, the technology is inherently very robust while also offering the possibility of compacting it in a small form factor. All these features are attractive for material analysis and in-line inspection, essential in the high-tech semiconductor, glass, photonic, and display industries.
Fields of science
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Programme(s)
Funding Scheme
CSA - Coordination and support actionCoordinator
08860 Castelldefels
Spain