The overarching goal of DEMETER has been to develop rhombic quadruple quantum dot (RQQD) systems using strained Ge/SiGe heterostructures, providing a robust platform for high-fidelity qubit manipulation.
This core objective was underpinned by with the following targets:
1. High-Precision Fabrication of Quantum Dot Devices:
• Development of Ge-based RQQD systems with precisely defined gate structures.
• Advancement of electron beam lithography (EBL) techniques to enhance resolution and pattern fidelity.
• Implementation of titanium nitride (TiN) gate technology, known for its superconducting properties and compatibility with quantum applications.
2. Characterization and Quantum Readout Implementation:
• Electrical and structural validation of fabricated quantum dot devices.
• Explore coherence time (T2) optimization to exceed 1 μs, ensuring prolonged quantum information retention.
• Achieve single-qubit gate operations exceeding 140 MHz, enabling faster computation.
• Implementing RF-based fast qubit readout exceeding 6 MHz, which is crucial for scalable architectures.
During the fellowship, I successfully designed and fabricated multiple batches of quantum devices, including RQQDs and Hall-bar structures. The full process—mesa etch, ALD, ohmic contact formation, fine-line gate patterning—was carried out using high-resolution EBL and TiN deposition techniques. I also developed and optimized HSQ-based EBL processes, which led the foundation for showcasing high-fidelity multi-gate TiN patterning applicable to both planar and fin-type quantum structures.
The fabricated devices were tested at room temperature and then shipped to our collaborators for low-temperature quantum transport measurements. While final benchmarking is ongoing, all device processing steps, and planned deliverables were completed. The groundwork is in place for deeper characterization and further publications.
While there is still progress to be made on quantum measurements, the project has made significant strides on the fabrication and characterization of RQQD systems using strained Ge/SiGe heterostructures. By leveraging advanced nanofabrication techniques, one of the core achievements of the project has been the successful fabrication of high-precision quantum dot devices, with particular emphasis on electron beam lithography (EBL) and titanium nitride (TiN) gate technology. These advancements can be used for multigate prototype architectures of two types of spin-qubit devices, yielding higher fidelity and reproducibility of quantum gate structures than the commonly used lift-off process, thereby paving the way for more reliable qubit operations in a scalable architecture. Additionally, the integration of RF-based fast readout methodologies aims to enhance qubit measurement speed, a crucial step toward practical quantum computing implementations.