Scientific and Technical Details
The synthesized fluorographene was extensively studied to address its stability limitations. To improve stability, a graphene/fluorinated graphene heterostructure (Gr/F-Gr HS) was developed. The fluorination process and the resulting material properties were systematically investigated using Raman spectroscopy, X-ray photoelectron spectroscopy (XPS), and ultraviolet photoelectron spectroscopy (UPS). Raman spectroscopy provided initial evidence of the fluorination process through the emergence of sp³-related vibrational modes, indicating the conversion of sp2 carbon to sp3 bonding. This observation was further confirmed by X-ray photoelectron spectroscopy, where the appearance of a distinct F1s core-level peak unambiguously verified the presence of fluorine in the fluorinated graphene layer. Ultraviolet photoelectron spectroscopy measurements revealed that the fluorinated graphene exhibited insulating behaviour after fluorination. However, upon formation of the graphene/fluorinated graphene heterostructure, the electronic structure showed a restoration of conductivity, highlighting the beneficial role of the heterostructure configuration. Comprehensive analysis of the experimental results indicated the presence of electrostatic interactions between the graphene and fluorinated graphene layers. Due to these interactions, a fraction of fluorine atoms was found to bind to the top graphene layer. This phenomenon contributes to the stabilization of the heterostructure and is consistent with the defect passivation mechanism in fluorinated bilayer systems. In addition, ultraviolet-visible (UV-Vis) absorption spectroscopy was employed to examine the optical response before and after fluorination. A reduction in optical absorption was observed following fluorination, consistent with the transition toward an insulating state. Notably, the graphene/fluorinated graphene heterostructure exhibited an enhanced optical absorption, demonstrating the advantageous optical properties of the heterostructure architecture. The electrical properties of fluorographene system is also investigated and it is found that the Gr/F-Gr HS has better electrical properties than only F-Gr.
The synthesized Sn-doped In2O3 nanocrystals optical, structural, and electrical properties were investigated. The Sn-doped In2O3 nanocrystals exhibited a pseudo-spherical morphology with a well-controlled, monodisperse size distribution. Optical absorption measurements showed a pronounced absorption peak located within the target infrared wavelength region, confirming their suitability for infrared optoelectronic applications. The electrical properties of the Sn-doped In2O3 nanocrystals were systematically investigated to evaluate charge transport behavior and inter-nanocrystal interactions. The results demonstrated that thermal annealing significantly improves the electrical performance of the nanocrystal films by enhancing nanocrystal confinement and interparticle coupling, leading to improved charge transport characteristics. Finally, heterostructures composed of graphene (Gr), fluorographene (F-Gr), and graphene/fluorographene (Gr/F-Gr) were successfully integrated with Sn-doped In2O3 nanocrystals using a simple and scalable spin-coating technique, establishing the material platform required for subsequent optoelectronic device fabrication.
The main Achievement of INFRALIGHT
1. Successful synthesis and optimization of heavy-metal-free nanomaterials, including semiconducting fluorographene and Sn-doped In2O₃ nanocrystals, within the planned project timeframe.
2. Development of wafer-scale semiconducting fluorographene using a newly established plasma fluorination technique, extending beyond the initially proposed XeF2-based approach and enabling fabrication on rigid, transparent, and flexible substrates.
3. Demonstration of enhanced stability through graphene/fluorographene heterostructures (Gr/F-Gr), supported by comprehensive spectroscopic analysis (Raman, X-ray photoelectron spectroscopy, ultraviolet photoelectron spectroscopy), revealing defect passivation and favourable electrostatic interlayer interactions.
4. Establishment of tunable infrared plasmonic behavior in Sn-doped In2O3 nanocrystals, with controlled morphology, monodisperse size distribution, and optimized electrical properties via post-synthesis annealing.
5. Successful integration of graphene-based materials with Sn-doped In2O₃ nanocrystals through scalable spin-coating techniques, enabling the fabrication of hybrid heterostructures suitable for infrared optoelectronic device architectures.
6. Creation of a robust material and device platform for investigating plasmon-induced hot-carrier generation and charge transfer mechanisms in heavy-metal-free infrared optoelectronic systems.