European Commission logo
español español
CORDIS - Resultados de investigaciones de la UE
CORDIS
Contenido archivado el 2024-05-29

Radical Innovation Maskless Nanolithography

Objetivo

The STREP proposal Radical Innovation Maskless Nanolithography (RIMANA) aims to research and develop a key maskless nano-patterning technology for low to medium volume production, essential for the semiconductor industry and emerging nanotechnology industry.

RIMANA is driven by two global industrial needs:

- An ML2 tool for short run and low to medium volume leading edge device manufacturers (Logic, ASIC, Silicon Foundries)
- A fast Mask Writer for the leading edge high volume device manufacturers (MPU, DRAM, Logic)

Both global industrial needs are addressed by the proposed RIMANA project with the following overall S/T objectives and work plans:

- Concept and realisation of a new, highly innovative compact APS (Programmable Aperture Plate System), including high-speed electronics with the ability to generate a massive parallelisation of electron beams for the 32nm technology node and beyond
- Concept and realization of Data Path improvements to achieve higher data rates
- Design and generation of test benches to demonstrate sub-32nm node ML2 high throughput capabilities in resist
- Brainstorm of results with perspectives for potential industrial realisation

The key challenges will be to explore and develop essential elements for the massive parallelisation of electron-beams and electron-optics, retaining ultimate resolution down to the nanometre scale, while minimising throughput-resolution trade-offs.

The project will be carried out by a strong and diversified team from industry, academia and acclaimed European research institutes, under the leadership of IMS Nano-fabrication GmbH, an SME with extensive experience in cutting-edge charged particle nano-fabrication research and technology.

RIMANA is harmonised completely with the FP6 strategic objective IST NMP-3. In particular, RIMANA addresses the need for "maskless nano-patterning for low to medium volume production for the 32nm node and beyond".

Tema(s)

Data not available

Convocatoria de propuestas

Data not available

Coordinador

IMS NANOFABRICATION GMBH
Aportación de la UE
Sin datos
Dirección
SCHREYGASSE 3
1020 WIEN
Austria

Ver en el mapa

Coste total
Sin datos

Participantes (7)