Exploitable results MODSYMEL: integrated analyses of semiconductors In the semiconductor industry, the crystalline structure at the sub-micron scale has a major influence on material properties, and hence function. Structural investigation to determine lattice properties and how they are modified during processing is this crucial. X-ray diffraction is a widely recognized and used tool for non-destructive structural characterization. MODSYMEL is a high performance computer-controlled X-ray diffraction system which uses a variety of techniques sensitive to different material properties. This single instrument provides many different structural characterizations of semiconductor crystalline materials, for measurement and control of leading-edge manufacturing processes. MODSYMEL has interchangeable attachments, with X-ray optical elements specifically developed for different applications. Computer aided modelling was used to develop the most suitable diffraction geometries for production level analysis of both silicon and compound semiconductor materials. Attachments can be changed rapidly with only minor adjustments needed of the primary X-ray beam alignment. All axes are motor driven, with a precision of 0.0001 degrees for the two main axes. Most functions are computer-controlled, included the set-up for quick and accurate alignment; a powerful software package is included for the evaluation and presentation of data. Searching for OpenAIRE data... There was an error trying to search data from OpenAIRE No results available
