Objective
- Assess SAPI "Chamber-Flow" acid pre-furnace in ELMOS new 150 mm fab-line.
- Establish and meet target specification for the quality of the cleaning process in terms of particles (<0.05/cm2 at 0.3 micron ), metal contamination (<1.0 x 10atoms/c2 for common metals), and surface roughness (<0.5 nm over 100 x 100 micron.
- Establish cost effective, "Caro"-HF-last, cleaning process to above specification as first step.
- Establish "High-Rel", highest quality, cleaning process to improved specification as second step.
- Correlate cleaning efficiency with actual yield on reliability data from running production.
- Characterise the "Chamber-Flow" in terms of CoO, uptime (>95%), MTBF (>500 Hrs), MTTR (<5 Hrs), reproducibility and safety.
The "Chamber-Flow" acid wafer cleaning equipment of SAPI provides an ideal capability for an ASIC mini-fab, such as ELMOS or ZMD, to break away from the conventional robotic wet bench acid cleaning systems, with their high operating costs and over-capacity (1000 wafers/hour), and to use the appropriate capacity of a smaller modular system. Several other advantages, like small footprint, complete air-free "dry-to-dry" process and "piston-effect" rinsing bring advantages over robotic wet benches.
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Programme(s)
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Multi-annual funding programmes that define the EU’s priorities for research and innovation.
Topic(s)
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Funding Scheme
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Funding scheme (or “Type of Action”) inside a programme with common features. It specifies: the scope of what is funded; the reimbursement rate; specific evaluation criteria to qualify for funding; and the use of simplified forms of costs like lump sums.
Coordinator
44227 Dortmund
Germany
The total costs incurred by this organisation to participate in the project, including direct and indirect costs. This amount is a subset of the overall project budget.