This research activity aims to demonstrate an economically viable and scalable nano-manufacturing method using a modified Chemical Vapor Deposition technique and a nano pattern transfer method based on silicon nanomembrane technology for the fabrication of nanostructured polymeric device components for electronics and photonics. The multidisciplinary nature of the proposed research will fuse science and engineering to overcome technological roadblocks for heterogeneous integration of polymeric materials into conventional micro- and nano-fabrication processes. The economically viable and scalable nano-manufacturing methods will enable the use of polymeric materials in conventional & future device designs opening new opportunities for electronic and photonic applications. The research will also address the need for novel polymeric materials with better chemical and thermal stabilities, and scalable processes that can take advantage of these chemistries to fabricate electronic/photonic devices reliably at low temperatures and at a reduced cost. The proposed method of integration of polymeric nanostructures into conventional nano-fabrication processes is scalable to a wafer size process and can also be optimized for roll-to-roll processing. The proposed work will advance the use of polymeric materials in semiconductor manufacturing in a real and significant way.
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