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Exploring new limits to Moore's law

Objective

This research proposal is about Extreme Ultra Violet Lithography (EUVL), the next generation technology chosen by the electronics industry to manufacture integrated circuits in 2010 and beyond. It represents an opportunity to boost the intensive efforts made by industry to reach new standards in lithography and achieve European leadership in the highly competitive sector of electronics manufacturing technology and know-how. The Integrated Project more Moore will involve various large and small manufacturing companies and research institutes or universities, all highly specialised in the key domains of EUVL and at the vanguard of European lithography research and development. Under the co-ordination of a leading European manufacturer of chip making equipment, the consortium constitutes a unique platform to integrate expertise in key branches of lithography, and to produce breakthrough technological solutions. The project will develop, ahead of the ITRS international roadmap (described in the main report), semiconductor devices shrunk by an order of magnitude down to the 5-nm size. The essential elements of the "More Moore" integrated research project can be summarised as follows:
- More Moore will build upon and complement the work done in EUVL under National and EUREKA programmes, especially MEDEA+;
- The research will push the limits of lithography to enable and exceed the requirements for the 22 nm node;
- As an Integrated Project, it will extend the RandD network in this domain by including all capable institutes, universities and SME's.

Funding Scheme

IP - Integrated Project

Coordinator

ASML NETHERLANDS B.V.
Address
De Run 6501, 5504 Dr
5500 AH Veldhoven
Netherlands

Participants (24)

ADVANCED MASK TECHNOLOGY CENTER GMBH AND CO. KG
Germany
CARL ZEISS SMT AG
Germany
CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE
France
Address
17, Rue Des Martyrs (Cea-leti)
38054 Grenoble
COMMISSARIAT A L'ENERGIE ATOMIQUE
France
Address
17 Avenue Des Martyrs
38054 Grenoble
ENTE PER LE NUOVE TECNOLOGIE, L'ENERGIA E L'AMBIENTE
Italy
Address
Via Enrico Fermi 45
00044 Frascati
EPPRA SOCIETE PAR ACTIONS SIMPLIFIEE
France
Address
16 Avenue Du Québec
91961 Courtaboeuf
FOCUS GMBH GERAETE ZUR ELEKTRONENSPEKTROSKOPIE UND OBERFLAECHENANALYTIK
Germany
Address
Am Birkhecker Berg 20
D-65510 Hünstetten
FRAUNHOFER GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V.
Germany
Address
Schottkystrasse 10
91058 Erlangen
IMAGINE OPTIC
France
INSTITUTE OF SPECTROSCOPY OF RUSSIAN ACADEMY OF SCIENCE
Russia
Address

142092 Troisk, Moscow Region
INTERUNIVERSITAIR MICRO-ELECTRONICA CENTRUM VZW
Belgium
JOHANNES GUTENBERG-UNIVERSITAET MAINZ
Germany
Address
Staudinger Weg 7
55099 Mainz
NATIONAL CENTRE FOR SCIENTIFIC RESEARCH "DEMOKRITOS"
Greece
NETHERLANDS ORGANISATION FOR APPLIED SCIENTIFIC RESEARCH - TNO
Netherlands
Address
Stieltjesweg 1
2628CK Delft
PHILIPS EXTREME UV GMBH
Germany
PHYSTEX
Netherlands
SAGEM SA
France
SIGMA-C GMBH SOFTWARE
Germany
SINCROTRONE TRIESTE SOCIETA CONSORTILE PER AZIONI
Italy
SOCIETE PAR ACTIONS SIMPLIFIEE XENOCS
France
STICHTING VOOR FUNDAMENTEEL ONDERZOEK DER MATERIE
Netherlands
Address
Edisonbaan 14
3430 BE Nieuwegein
TECHNISCHE UNIVERSITEIT DELFT
Netherlands
UNIVERSITAET BIELEFELD
Germany
XTREME TECHNOLOGIES GMBH
Germany
Address
Hans-böckler-str. 27
37079 Göttingen